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ProductsProductsCopper Anode

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Manufacturing Purposes

Description of Product

Oxygen Free Copper

Copper containing neither oxygen nor reducing agent, which is melted and cast or melted with reducing by charcoal in vacuum. Its oxygen content shall be 0.001%(10ppm) or less. It shows good electrical conductivity, no hydrogen brittleness and excellent machinability.

Pyrophosphate Copper

Adding phosphorus for deoxidization to tough pitch (electrolytic tough pitch, ETP) copper, which is obtained by melting and refining electrolytic copper, makes phosphorus deoxidized copper(DLP or DHP), which is to be transformed, with adequate quantity of phosphorus added, to pyrophosphate copper of which oxygen and residual phosphorus content should be 0.01% or less and 0.040 to 0.065%, respectively.

Use of Product

Application to PCB plating and undercoating(pyrophosphate copper ball)

Size Productible by Product Type

Specification Ball Size(mm) Weight(g)
Ф55 54.0 ~ 56.5 800±10
Ф50 49.0 ~ 52.0 600±6
Ф45 43.5 ~ 46.0 425±6
Ф38 36.5 ~ 39.0 256±6
Ф30 28.5 ~ 31.0 125±5
Ф25 23.5 ~ 26.0 74±5
Ф11 9.5 ~ 13.0 7±3

Packing Available by Product Dimension

Nugget products are available on request
Perfect sphere products are available at the request of a customer who uses automatic input equipment.
Packing Unit: 20 kg / Paper box, 1,000 kg (50 boxes)

Chemical Composition and Mechanical Properties

Chemical composition

Alloy number Chemical composition, wt.%
KS/JIS UNIS Cu Pb Fe Sn Zn Others
- C10200 99.96↑ - - - 0.001↓ O²: 10ppm or less
- C12220 99.90↑ - 0.040 ~ 0.065 - 0.01↓ P: 450ppm Target

Mechanical Properties

Alloy number Standard number Temper designation Diameter and length between opposite sides Tensile strength(Mpa) Elongation(%) Hardness(HRB)
KS/JIS UNIS
- - - - - - - -

Plaing Properties of Oxygen Free Copper and Pyrophosphate Copper

  Oxygen free copper Pyrophosphate copper
Electrolyte Acid and alkali in common/cyanide solution Acid designated/acid copper sulphate
Current Density High: appr. 3A/dm² Low to medium: appr. 2.2A/dm²
Polishing Not polished Polished
Plating Method Horizontal Vertical
Use Plating of high performance PCB and electroless plating Plating of high performance PCB and undercoating of general products
Remarks Favorable to precise plating Favorable to mass production